Preparation Method Of Amorphous Silicon Solar Cell

There are many methods for amorphous silicon solar cells, including plasma-enhanced chemical vapor deposition, reactive sputtering, glow discharge, electron beam evaporation, and thermal decomposition of silane.
1. Reactive sputtering method: First, use infrared laser to laser scribe the TCO conductive glass substrate; after laser scribe, perform ultrasonic cleaning; after cleaning the substrate, put it into a special deposition fixture and push it into the oven for preheating; preheating The post-deposition fixture is pushed into the PECVD deposition vacuum chamber, and the amorphous silicon is deposited using the PECVD deposition process; then the green laser is used to perform a second laser scribing on the deposited amorphous silicon substrate, and cleaning is performed after scribing; then The cleaned substrate is plated with a metal back electrode composite film using PVD technology, and the zinc oxide layer as one of the metal back electrode composite films is deposited on the surface of the amorphous silicon layer, and other metal back electrode layers are deposited on the zinc oxide layer; then Use the green laser to perform the third laser scribing on the substrate with the deposited metal back electrode, and clean it after scribing. So far, the structure of the battery chip has been formed; after that, the battery chip is laminated and packaged, and the junction box and lead wires are installed. Finally, perform performance testing on the components, and pack qualified products into boxes. Depending on the size and specifications of the photovoltaic modules produced, the production cycle generally takes three to four hours.
2. Plasma-enhanced chemical vapor deposition method: a series of deposition chambers are used to form a continuous program in production to achieve mass production. At the same time, the amorphous silicon solar cell is very thin and can be made into a stacked type, or manufactured by an integrated circuit method. On a plane, with an appropriate mask process, multiple cells in series can be made at one time to obtain a higher voltage.
3. Glow discharge method: a quartz container is evacuated, filled with silane diluted with hydrogen or argon, heated with a radio frequency power source to ionize the silane to form plasma, and the amorphous silicon film is deposited on the heated substrate superior.