| LOT | PRODUCT | DIAMETER | CRYSTAL | TYPE | DOPANT | ORIENTATION | THICKNESS | RESISTIVITY | |
| 501061S | Al | 200 | CZ | P | B | 100 | 725±25 | 1~100 | 200-300A Ti followed by 8000A PVD Sputtered Al-Cu 0.5% |
| 501201 | EPITAXIAL | 200 | CZ | P | B | 100 | 700~750 | <0.1 | P/B T1~50/R1~50, MFG 22-MAY-2024 |
| 501202 | EPITAXIAL | 200 | CZ | N | Ph RED | 100 | 700~750 | 0~0.05 | N/Ph T1~10/R0.01~1, MFG 27-MAY-2024 |
| 522101 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.01~0.02 | |
| 522102 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.009~0.02 | |
| 522103 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.015~0.02 | |
| 522104 | POLISHED | 200 | CZ | P | B | 100 | 705~745 | 0.014~0.022 | |
| 522105 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.014~0.02 | |
| 522106 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.001~0.003 | |
| 522107 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.0025~0.0035 | |
| 522108 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.005~0.01 | |
| 522109 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.002~0.0033 | |
| 522110 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.0035~0.004 | |
| 522111 | POLISHED | 200 | CZ | P | B | 100 | 640±13 | 0.012~0.0175 | LTO+NoLM |
| 522112 | POLISHED | 200 | NA | N | As | 100 | 725±15 | 0.001~0.003 | |
| 522113 | POLISHED | 200 | CZ | P | B | 111 | 725±15 | 0.005~0.01 | |
| 522114 | POLISHED | 200 | CZ | P | B | 100 | 725±50 | 1~65 | |
| 522115 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | ≤40 | |
| 522116 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.002~0.003 | |
| 522117 | POLISHED | 200 | CZ | P | B | 100 | 710~740 | 0.0033~0.005 | |
| 522118 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.003~0.004 | |
| 522119 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.001~0.003 | |
| 522120 | POLISHED | 200 | CZ | P | B | 111 | 725±20 | 0.002~0.005 | |
| 522121 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.003~0.0035 | |
| 522122 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.008~0.02 | |
| 522123 | POLISHED | 200 | CZ | P | B | 100 | 725±15 | 0.0023~0.004 | |
| 522124 | ETCHED | 200 | NA | NA | NA | NA | 745 | NA | LTO+NoLM |
| 522125 | POLISHED | 200 | CZ | P | B | 100 | 705~745 | 0.01~0.02 | LTO+NoLM |
| SO617PRAU | Sputtered Au | 150 | CZ | P | B | 100 | 500±15 | 10~25 | Sputtered Ti30nm+Au100nm |
| PS241025006 | SOI | 200 | CZ | P | B | 100 | 650±5 | 8~12 | Device : 30±0.5μm, 0.01~0.02 ohm.cm / Box : 1±0.1μm, Notch<110> |
| 503141 | POLISHED | 100 | CZ | P | B | 110 | 20000±100 | 1~100 | |
| PS250407006 | SOI | 200 | CZ | N | Ph | 100 | 725±10 | 1~10 | Device : 2±0.5μm / Box : 1000nm±5% |
| PS250407007 | SOI | 200 | CZ | N | Ph | 100 | 725±10 | 1~10 | Device : 10±0.5μm / Box : 1000nm±5% |
| PS250407008 | SOI | 200 | CZ | N | Ph | 100 | 725±10 | 1~10 | Device : 3±0.5μm / Box : 1000nm±5% |
| 505061 | JGS1 | 100 | 555±7 | DSP,Sq<0.5nm, 10/5, TTV<5μm, Flat 32.5mm | |||||
| 505301 | OXIDE+Nitride | 200 | CZ | P | B | 100 | 725±25 | 1~100 | 3μm Thermal Oxide+300nm LPCVD Nitride |
| 203171PW3PT | Sputtered Pt | 150 | CZ | N | Ph | 100 | 675±25 | 0.001~0.005 | 3000A Thermal Oxide+Ti50nm+Pt 200nm |
| 506162 | POLISHED | 200 | CZ | N | Ph | 100 | 700~750 | 1000~12000 | N/Ph T1~10/R0.01~1, MFG 27-MAY-2024 |
4,6,8inch Silicon Wafer Inventory Update_202506
Jun 20, 2025
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